The Quantum World, Discovered Differently
llustration of the metasurface converting incoming photons into quantum entangled photon pairs
– Sandia National Lab, USA
Nano imprint Lithography (NIL) :
A low-carbon and cost-effective solution
Step I
Press Mode
Step II
UV or Heat
Step III
Remove Mold
Nanoimprint lithography is a technique that enables the replication of sub-micrometric fine features at wafer level and can be ideally applied onto any substrates. It is viewed as an alterative production solution compared with E-beam and EUV lithography.
Particularly, NIL is suitable for the following product demands:
❑ Structure resolution < 100nm
❑ Function-oriented materials or non-Si substrate
❑ Hybrid or complex structure – 2D/3D irregular distributed shape
❑ Medium-to- small economic or highly customized production scale
See NIL applications
come to life
Our Team
Our team has been developing the world leading process technology in Nanoimprint lithography(NIL) for production consideration. Since 2007, we successfully implemented NIL process onto high volume LED wafers, hard sapphire substrates and fragile InP laser wafers for production. With the unique developed process flow, our team has integrated NIL process into several industry standard processes to deliver the products with nano-structure inside. With decade experience in NIL, we are capable of manufacturing highly customized fine structures on different materials and keep elaborating our NIL technique to approach the quantum filed application.
2006-2007
Team was born
Team was born
Team was formed in Mesophotonics Limited, UK
2009
Kick-off
1st NIL production Kick-off
Built up the 1st NIL production line for LED chip fabrication in Taiwan
2010
LED
NIL in production
NIL for Pattern Sapphire Substrate (PSS) in production – HB GaN LED
2011-2015
Extension
NIL in development
NIL on different substrates up to 6” were successfully demonstrated
2016
Acquisition
IQE acquires the Team
Team, IP and NIL equipment were acquired by IQE Plc for DFB laser wafer grating fabrication
2020
Laser
NIL in production
NIL grating for InP DFB laser wafers in production
2021-2022
Integration
NIL in development
NIL for different laser wafers are under qualification
2022
Promotion
NIL Foundry
NIL BU independent of IQE Plc
Services & Products
Services & Products
Nano-Fabrication Foundry Service
➤ NIL & Photo-litho Process
➤ III-V Material Etch
➤ Alignment Mark Fabrication
➤ Optical Design Simulation
➤ NIL Process
➤ Glass/Quartz Material Etch
➤ Photonic Crystal & Photonic Quasi-crystal Design Simulation
➤ NIL & Photo-litho Process
➤ III-V Material Etch
➤ Display
➤ μLED & QD LED
➤ Bio-sensing/Detection Template
➤ Biomimetic Surface
Nano-Fabrication Service Techniques & Specifications
➤ Minimum CD in production: 25nm
➤ Fragile & bowling wafers can be applied
➤ Workable thickness of wafers: 75 µm ~ 2mm
➤ High-end E-beam tool for NIL mold/master fabrication
➤ Process alignment mark fabrication by both of NIL and photo-litho
➤ Crystalline alignment along the major flat of wafers: < 0.02O
➤ Dedicated dry etch tools for different materials
➤ Dry etch thickness variation within wafers: +/- 3nm
➤ Possesses both of dry and wet etch
➤ PWE & FDTD self-developed codes
➤ Photon emitting beam shaping
➤ Photon block & diffracted mode simulation
Get in Touch
3F, NO. 11, Kejung Rd., Chu-Nan Site, Hsinchu Science Park, Chu-Nan 350, Miao-Li County, Taiwan
TEL : 886-37-584-086
FAX : 886-37-584-225
